SUBSTRATE PROCESSING APPARATUS AND METHOD OF FORMING A THIN FILM AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE USING THE SAME

摘要

The present invention provides a substrate processing device, and a manufacturing method thereof. The substrate processing device includes: first and second process areas; first and second division areas for dividing the first and second process areas; and a third process area for performing plasma doping by flowing partial reaction gas of the first process area into a space between the second process area and the second division area.