发明名称 |
TRANSPARENT VAPOR- DEPOSITED FILM |
摘要 |
<p>Employed is a roller- type continuous vapor- deposited film forming device in which a film- forming section and a preprocessing section provided with a plasma preprocessing device are arranged in series at a distance from each other. With a substrate transported at a high speed , plasma (P) is supplied to the substrate surface side while set to an electrically positive potential by a plasma preprocessing means for supplying the plasma toward the substrate (S) in a space enclosed in a preprocessing roller, and enclosed in a plasma supply means for supplying a plasma- forming gas and in a magnet (21), which is a magnetism formation means. An active preprocessed surface is formed on the surface of the substrate (S). An inorganic oxide vapor -deposited film having as a principal component thereof an aluminum oxide containing AL- C covalent bonds is immediately formed at high speed in succession on the preprocessed surface of the substrate to produce a highly adhesive transparent vapor- deposited film.</p> |
申请公布号 |
IN3311DEN2015(A) |
申请公布日期 |
2015.10.09 |
申请号 |
IN2015DE03311 |
申请日期 |
2015.04.20 |
申请人 |
DAI NIPPON PRINTING CO., LTD. |
发明人 |
MATSUI SHIGEKI;ASUMA TATSUO;KOMURO TERUHISA;MIYAMA HIROSHI;GOTO TAKAKAZU;MIYAZAKI KAORU;MATSUZAKI HIROSHI |
分类号 |
B32B9/00;C23C14/08 |
主分类号 |
B32B9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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