发明名称 MICROWAVE-BASED GLASS LAMINATE FABRICATION
摘要 Methods of fabricating a glass laminate is provided. According to one embodiment, a glass laminate comprised of a microwave absorbing layer and a microwave transparent layer is formed. The microwave absorbing layer is characterized by a microwave loss tangent δH that is at least a half order of magnitude larger than a loss tangent δLof the microwave transparent layer. An area of the glass laminate is exposed to microwave radiation. The exposed area comprises a cross-laminate hot zone having a cross-laminate hot zone temperature profile. Substantially all microwave absorbing layer portions of the hot zone temperature profile and substantially all microwave transparent layer portions of the hot zone temperature profile reside above the glass transition temperature TG of the various layers of the glass laminate prior to impingement by the microwave radiation. In accordance with another embodiment, a method of fabricating a glass laminate is provided where the exposed area of the glass laminate is characterized by a viscosity below approximately 1×104 poise.
申请公布号 US2015284282(A1) 申请公布日期 2015.10.08
申请号 US201514743415 申请日期 2015.06.18
申请人 Corning Incorporated 发明人 Godard Hilary Tony;Peng Gaozhu;Peterson Irene Mona;Schulz Rebecca Lynn;Squier Gary Graham
分类号 C03B17/06;C03B23/023;C03C23/00;C03B27/012 主分类号 C03B17/06
代理机构 代理人
主权项 1. A method comprising: exposing an area of a glass laminate to microwave radiation, wherein: the glass laminate comprises a microwave absorbing layer and a microwave transparent layer, and a microwave loss tangent δH of the microwave absorbing layer is at least a half order of magnitude larger than a microwave loss tangent δL of the microwave transparent layer, at least at one or more temperature points at which the glass laminate exhibits a viscosity of between approximately 1×102 poise and approximately 1×1013.3 poise; andin the exposed area of the glass laminate, each of the microwave absorbing layer and the microwave transparent layer is at a temperature above a glass transition temperature TG of the respective layer prior to exposure to the microwave radiation.
地址 Corning NY US