| 摘要 |
The present invention relates to a polyvinyl acetate brush which is used in a wafer cleaning step in a semiconductor CMP process or is used to clean the surface of a flat panel used in a display device. More specifically, the semiconductor wafer cleaning brush unit has a core having a hexagonal-shaped outer periphery to prevent distortion and displacement even when the brush is used to clean continuously for an extended period of time. The brush does not need a separate support member in a process of coupling the brush and the core to simplify the structure and significantly increase the durability accordingly. More specifically, the brush and the core are respectively manufactured and coupled together through insert-coupling, thereby increasing the productivity and manufacturing convenience. Cleaning water outlets are arranged in six directions due to the core having the hexagonal shape. Accordingly, the present invention can enhance the cleaning performance by uniformly discharging the cleaning water. |
