发明名称 PLASMA REACTOR AND CONTROL METHOD THEREOF
摘要 An aspect of the present invention relates to a plasma reactor and to a control method thereof. The plasma reactor according to the present invention comprises: a body of the reactor having a discharge space; a first electrode included in the upper part of the body of the reactor and receiving power from a power supply; a second electrode included in the body of the reactor to face the first electrode and supporting a substrate to be treated; and an igniting electrode buried in the first electrode near multiple gas spray holes arranged on the first electrode to initiate plasma discharge inside the body of the reactor. According to the plasma reactor and a control method thereof of the present invention, the success rate of initial ignition for generating plasma can be increased by including the igniting electrode around the spray holes for spraying process gas. Therefore, production costs can be reduced as the rate of loss, which can be generated in the case of a failure in initial ignition, can be reduced. Also, plasma with a large area can be generated stably.
申请公布号 KR20150113667(A) 申请公布日期 2015.10.08
申请号 KR20140037986 申请日期 2014.03.31
申请人 CHOI, DAI KYU 发明人 CHOI, DAI KYU
分类号 H05H1/24;H05H1/34 主分类号 H05H1/24
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