发明名称 |
CAPACITATIVE ELEMENT AND SEMICONDUCTOR DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor device having a transistor excellent in electric characteristics; or provide a semiconductor device which has a high opening ratio and which can increase charge capacity.SOLUTION: A semiconductor device has a transistor and a capacitative element on an insulating surface. The transistor has: a gate electrode; an oxide semiconductor film which overlaps the gate electrode; a gate insulation film between the gate electrode and the oxide semiconductor film; first conductive films which function as a pair of electrodes which contact the oxide semiconductor film; an oxide insulation film which contacts the oxide semiconductor film; a metal oxide film formed on the oxide insulation film; and a second conductive film which is formed at an opening of the metal oxide film and contacts the first conductive films and functions as a pixel electrode. The capacitative element has: a conductive film on the gate insulation film; a second conductive film; and a metal oxide film provided between the conductive film and the second conductive film. |
申请公布号 |
JP2015179810(A) |
申请公布日期 |
2015.10.08 |
申请号 |
JP20140168105 |
申请日期 |
2014.08.21 |
申请人 |
SEMICONDUCTOR ENERGY LAB CO LTD |
发明人 |
YAMAZAKI SHUNPEI;HIZUKA JUNICHI;KATAYAMA MASAHIRO;KAMINAGA MASAMI |
分类号 |
H01L29/786;C23C14/14;G02F1/1368;G09F9/30;H01L21/316;H01L21/336;H01L21/363;H01L21/822;H01L21/8234;H01L27/04;H01L27/06 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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