发明名称 PROCESSING APPARATUS AND PROCESSING METHOD
摘要 The present invention provides a processing device capable of efficiently performing a drying and a curing process of an organic material layer coated on a substrate. An electromagnetic wave irradiation device (5) irradiating an electromagnetic wave to an organic material layer comprises: an electromagnetic wave source (21); an antenna unit (23) inducing the electromagnetic wave generated from the electromagnetic wave source to a processing container (1); a waveguide (25) connecting the electromagnetic wave source (21) and the antenna unit (23); a transmitting cover (27) covering the antenna unit (23). In the processing device (100), the electromagnetic wave may be irradiated in a plate shape according to an area toward the substrate (S) corresponded from the antenna unit (23) by configuring the antenna unit (23) by arranging a plurality of radiation antennas (35) having multiple slots (33).
申请公布号 KR20150113851(A) 申请公布日期 2015.10.08
申请号 KR20150038140 申请日期 2015.03.19
申请人 TOKYO ELECTRON LIMITED 发明人 SHIMIZU MASAHIRO
分类号 H01L51/56;H01L21/268;H01L21/683 主分类号 H01L51/56
代理机构 代理人
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