发明名称 |
CONFIGURATION INDEPENDENT GAS DELIVERY SYSTEM |
摘要 |
A gas delivery apparatus for supplying process gas to a processing chamber of a plasma processing apparatus includes a mixing manifold having a plurality of gas inlets on a surface thereof, the gas inlets being equally spaced from a center mixing point of the mixing manifold; and optionally a plurality of gas supplies in communication with the plurality of gas inlets on the surface of the mixing manifold. A method of supplying gas to a processing chamber of a plasma processing apparatus using such a gas delivery apparatus involves providing a plurality of gas supplies in communication with a plurality of gas inlets on a surface of a mixing manifold; flowing at least two different gases from the plurality of gas supplies to the mixing manifold to create a first mixed gas; and supplying the first mixed gas to a plasma processing chamber coupled downstream of the mixing manifold. |
申请公布号 |
US2015287573(A1) |
申请公布日期 |
2015.10.08 |
申请号 |
US201514680244 |
申请日期 |
2015.04.07 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
Taskar Mark;Shareef Iqbal |
分类号 |
H01J37/32;B01F15/02;B01F3/02 |
主分类号 |
H01J37/32 |
代理机构 |
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代理人 |
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主权项 |
1. A gas delivery apparatus for supplying process gas to a processing chamber of a plasma processing apparatus, the gas delivery apparatus comprising:
a mixing manifold comprising a plurality of gas inlets on a surface thereof, the gas inlets being equally spaced from a center mixing chamber of the mixing manifold; a plurality of gas supplies optionally in communication with the plurality of gas inlets on the surface of the mixing manifold; and at least one mixing manifold outlet. |
地址 |
Fremont CA US |