EXPOSURE MASK AND FABRICATION METHOD FOR COLOR FILTER

摘要

The present invention disclose a exposure mask for fabricating a color filter, the exposure mask includes a plurality of exposure regions; and a light-shielding region for isolating the plurality of exposure regions, wherein, an edge of each exposure region is provided with multiple first light-shielding patterns spaced apart with each other. The present invention also discloses a fabrication method for a color filter, comprising steps of: (a) providing a lower glass substrate fabricating having an array of thin film transistor (TFT); (b) fabricating a first insulation protection layer on the array of thin film transistor (TFT); and (c) applying a photolithography process to respectively fabricate color filter units to obtain the color filter; wherein, using the above described exposure mask for exposing.

主权项

1. An exposure mask for fabricating a color filter, comprising:
a plurality of exposure regions; and a light-shielding region for isolating the plurality of exposure regions, wherein, an edge of each exposure region is provided with multiple first light-shielding patterns spaced apart with each other.