发明名称 LAYER STRUCTURE AND METHOD OF MANUFACTURING LAYER STRUCTURE
摘要 PROBLEM TO BE SOLVED: To obtain a diffusion method which is appropriate for constituting a layered structure of a Galvanic cell.SOLUTION: A diffusion method is appropriate for constituting a layered structure of a Galvanic cell. In the Galvanic cell, a layer can be constituted in a porous form or with impermeability and can be advantageously manufactured by a jet method, a printing method, a screen method, a CVD-method, a lithography method or a transfer method, layer functional characteristics enable a single or arbitrary combination and include ion conductivity, electron conductivity, a hydrophobic property, a hydrophilic property, and a contact property, and simultaneously include mechanical characteristics such as excellent adhesion, tensile strength and fitted thermal expansion, and the layer is constituted in a porous or dense form.
申请公布号 JP2015179677(A) 申请公布日期 2015.10.08
申请号 JP20150100623 申请日期 2015.05.18
申请人 HAERING THOMAS 发明人 HAERING THOMAS
分类号 H01M8/02;B01D67/00;B01D71/52;B01D71/68;B01D71/80;B01D71/82;C08G65/48;C08G75/23;C08J5/22;H01M8/10 主分类号 H01M8/02
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