发明名称 POLISHING COMPOSITION
摘要 This polishing composition includes hydroxyethyl cellulose, water, and abrasive grains. The hydroxyethyl cellulose has a molecular weight of at least 500000, but not more than 1500000. The mass ratio of the hydroxyethyl cellulose to the abrasive grains is at least 0.0075, but not more than 0.025.
申请公布号 WO2015152150(A1) 申请公布日期 2015.10.08
申请号 WO2015JP59923 申请日期 2015.03.30
申请人 NITTA HAAS INCORPORATED 发明人 TERAMOTO, MASASHI;NAKAUCHI, TATSUYA;SUGITA, NORIAKI;HABA, SHINICHI;MIYAMOTO, AKIKO
分类号 C09K3/14;B24B37/00;H01L21/304 主分类号 C09K3/14
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