发明名称 MEASUREMENT METHOD OF IMPURITY DENSITY IN THIN FILM AND MEASUREMENT DEVICE THEREOF
摘要 <p>PROBLEM TO BE SOLVED: To improve measurement reliability of impurity density in a BPSG film by a fluorescent X-ray analyzer.SOLUTION: A measurement method of impurity density in a thin film measures the film thickness of a BPSG film sample by using a fluorescent X-ray analyzer and optical film thickness meter to calculate a reference film thickness ratio, measures the film thickness of a daily analysis sample by using the fluorescent X-ray analyzer and optical film thickness meter to calculate a sample film thickness ratio, and determines that B, P density obtained by the fluorescent X-ray analyzer is correct if the reference film thickness ratio and the sample film thickness ratio are close.</p>
申请公布号 JP2015179015(A) 申请公布日期 2015.10.08
申请号 JP20140056448 申请日期 2014.03.19
申请人 SEIKO INSTRUMENTS INC 发明人 SAKUMA TETSUYA
分类号 G01N23/223;G01N21/45 主分类号 G01N23/223
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