发明名称 |
URETHANE COMPOSITION AND POLISHING MATERIAL |
摘要 |
PROBLEM TO BE SOLVED: To provide a urethane composition excellent in hot water resistance.SOLUTION: A urethane composition comprises (i) a main agent containing a urethane prepolymer (A) obtained by reacting a polyol (a1) with a polyisocyanate (a2) containing p-phenylene diisocyanate (a2-1) and (ii) a hardener. A polishing material is also provided. The urethane composition has excellent hot water resistance and does not deteriorate in hardness due to heat generated in polishing and is also excellent in mechanical strength and abrasion resistance. The urethane composition is thus suitable as a material for polishing materials, e.g. polishing cloth and polishing pads. |
申请公布号 |
JP2015178558(A) |
申请公布日期 |
2015.10.08 |
申请号 |
JP20140056367 |
申请日期 |
2014.03.19 |
申请人 |
DIC CORP |
发明人 |
KOCHI MANABU;GOTO NAOTAKA |
分类号 |
C08G18/10;B24B37/24;C08G18/76;C08J5/14;H01L21/304 |
主分类号 |
C08G18/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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