| 摘要 |
The present invention provides a substrate processing device. The substrate processing device includes: a housing; a transport unit which transports a substrate in the housing in a first direction; a nozzle unit including a first nozzle and a second nozzle supplying processing liquid onto the substrate supported by the transport unit; and a processing liquid supply unit which supplies the processing liquid to the nozzle unit. The processing liquid supply unit includes: a processing liquid supply source; a first supply line which connects the first nozzle and the processing liquid supply source; a storage tank storing the processing liquid to be supplied to the second nozzle; a second supply line which branches from the first supply line, is installed with the second valve, and supplies the processing liquid from the processing liquid supply source to the storage tank; and a restoring line which branches from the second supply line and is installed with a restoring valve. |
