| 摘要 |
This invention provides a mask blank that, despite containing a chromium-based light-blocking film, allows high transfer precision when using a hard-mask-film pattern as a mask. In said mask blank, a semi-light-transmitting film (2), a light-blocking film (3), and a hard-mask film (4) are layered on top of a light-transmitting substrate (1) in that order. The semi-light-transmitting film (2) contains silicon, and the hard-mask film (4) contains silicon and/or tantalum. The light-blocking film (3) has a layered structure consisting of a bottom layer (31) and a top layer (33) and contains chromium. The top layer (33) contains at least 65 at.% chromium and less than 20 at.% oxygen, and the bottom layer (31) contains less than 60 at.% chromium and at least 20 at.% oxygen. |
