发明名称 CHEMICAL RESISTANCE IMPROVEMENT METHOD OF POLYMER FILM, DEPOSITION METHOD OF POLYMER FILM, DEPOSITION APPARATUS OF POLYMER FILM AND WORKPIECE CONVEYANCE MECHANISM
摘要 <p>PROBLEM TO BE SOLVED: To provide a chemical resistance improvement method of a polymer film capable of improving chemical resistance of the polymer film, and dispensing with a new separated processing unit for improving the chemical resistance of the polymer film.SOLUTION: In a chemical resistance improvement method of a polymer film for improving chemical resistance of the polymer film which is deposited on a surface to be treated of a workpiece, and which is treated by a chemical, a heat treatment for improving chemical resistance of the polymer film is performed in a workpiece conveyance mechanism 130 for conveying the workpiece 1.</p>
申请公布号 JP2015178663(A) 申请公布日期 2015.10.08
申请号 JP20140056947 申请日期 2014.03.19
申请人 TOKYO ELECTRON LTD 发明人 JO TOSHIHIKO
分类号 C23C14/58;B65G49/07;C23C14/12;H01L21/31;H01L21/312;H01L21/677 主分类号 C23C14/58
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