发明名称 |
CHEMICAL RESISTANCE IMPROVEMENT METHOD OF POLYMER FILM, DEPOSITION METHOD OF POLYMER FILM, DEPOSITION APPARATUS OF POLYMER FILM AND WORKPIECE CONVEYANCE MECHANISM |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a chemical resistance improvement method of a polymer film capable of improving chemical resistance of the polymer film, and dispensing with a new separated processing unit for improving the chemical resistance of the polymer film.SOLUTION: In a chemical resistance improvement method of a polymer film for improving chemical resistance of the polymer film which is deposited on a surface to be treated of a workpiece, and which is treated by a chemical, a heat treatment for improving chemical resistance of the polymer film is performed in a workpiece conveyance mechanism 130 for conveying the workpiece 1.</p> |
申请公布号 |
JP2015178663(A) |
申请公布日期 |
2015.10.08 |
申请号 |
JP20140056947 |
申请日期 |
2014.03.19 |
申请人 |
TOKYO ELECTRON LTD |
发明人 |
JO TOSHIHIKO |
分类号 |
C23C14/58;B65G49/07;C23C14/12;H01L21/31;H01L21/312;H01L21/677 |
主分类号 |
C23C14/58 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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