EXPOSURE APPARATUS, EXPOSURE METHOD, METHOD FOR PRODUCING DEVICE, AND OPTICAL PART

摘要

An exposure apparatus (EX) is an apparatus which exposes a substrate (P) by irradiating exposure light (EL) onto the substrate (P) via a projection optical system (PL) and a liquid (1). The exposure apparatus (EX) has a substrate table (PT) for holding the substrate (P), and a plate member (30) having a liquid repellent flat surface (30A) is replaceably provided to the substrate table (PT) to prevent the liquid from remaining, maintaining excellent exposure accuracy.

主权项

1. An exposure apparatus which exposes a substrate to light passing through a projection optical system and liquid, the exposure apparatus comprising:
a stage which is movable relative to the projection optical system; and a liquid supply system having a supply port to supply an optical path of the light from the projection optical system with liquid, the supply port being disposed above the stage, wherein the stage comprises: a substrate holder disposed in a recess of the stage to hold the substrate inside the recess; a moving member which supports a back surface of the substrate and lower the substrate to the substrate holder; and a flow passage connected to an internal space of the recess to remove liquid, which is supplied from the supply port, from the internal space, the flow passage being disposed inside the stage.