发明名称 METAL/CERAMIC BONDING SUBSTRATE AND METHOD FOR PRODUCING SAME
摘要 After a wet blasting treatment for jetting a slurry, which contains spherical alumina as abrasive grains in a liquid, to the surface of a ceramic substrate 10 of aluminum nitride sintered body so that the ceramic substrate 10 has a residual stress of not higher than −50 MPa and so that the surface of the ceramic substrate 10 to be bonded to the metal plate 14 has an arithmetic average roughness Ra of 0.15 to 0.30 μm, a ten-point average roughness Rz of 0.7 to 1.1 μm and a maximum height Ry of 0.9 to 1.7 μm while causing the ceramic substrate to have a flexural strength of not higher than 500 MPa and causing the thickness of a residual stress layer 10a formed along the surface of the ceramic substrate 10 to be 25 μm or less, the metal plate 14 of copper or a copper alloy is bonded to the ceramic substrate 10, which is obtained by the wet blasting treatment, via a brazing filler metal 12 to produce a metal/ceramic bonding substrate which has an excellent bonding strength of the ceramic substrate 10 to the metal plate 14 and which has an excellent heat cycle resistance.
申请公布号 US2015284296(A1) 申请公布日期 2015.10.08
申请号 US201214443505 申请日期 2012.11.20
申请人 DOWA METALTECH CO., LTD. ;TOKUYAMA CORPORATION 发明人 Osanai Hideyo;Kitamura Yukihiro;Aoki Hiroto;Kanechika Yukihiro;Sugawara Ken;Takeda Yasuko
分类号 C04B37/02;B32B18/00;C04B35/581;B32B15/04;C04B41/91;B23K1/19 主分类号 C04B37/02
代理机构 代理人
主权项 1. A metal/ceramic bonding substrate comprising: a ceramic substrate of aluminum nitride; and a metal plate bonded to the ceramic substrate, wherein the ceramic substrate has a residual stress of not higher than −50 MPa and wherein a bonded surface of the ceramic substrate to the metal plate has an arithmetic average roughness Ra of 0.15 to 0.30 μm.
地址 Tokyo JP