PATTERN FORMING METHOD, PATTERN FORMING DEVICE, AND COMPUTER READABLE MEMORY MEDIUM

摘要

PROBLEM TO BE SOLVED: To provide a pattern forming method that can promote arrangement of various polymers constituting a block copolymer into a desired pattern.SOLUTION: After a photoresist pattern to be used for forming a pattern of a block copolymer is formed on a substrate, the photoresist pattern is treated to develop hydrophilicity, a block copolymer comprising at least two kinds of polymers is applied on the substrate having the hydrophilic photoresist pattern so as to form a film of the block copolymer, and the substrate with the film formed is heated to selectively remove at least the two kinds of polymers.