发明名称 EXPOSURE METHOD AND EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To move a stage accurately along a predetermined path while linking between a plurality of heads.SOLUTION: An exposure apparatus comprises: an encoder system which measures positional information of a stage WST by a head facing lattice parts (39X, 39X, 39Y, 39Y) provided for the stage out of a plurality of heads (Enc1, Enc2, Enc3, Enc4, etc.); and a controller which controls the movement of the stage based on positional information to be measured. During the movement of the stage, one of the plurality of heads used for measurement is switched to another head, and after the switching, the positional information of the stage is measured by a plurality of heads including remaining heads other than the one head and the another head, and based on the positional information measured by the plurality of heads used before the switching, correction information for controlling the movement of the stage by using the another head after the switching is acquired.
申请公布号 JP2015179290(A) 申请公布日期 2015.10.08
申请号 JP20150121621 申请日期 2015.06.17
申请人 NIKON CORP 发明人 SHIBAZAKI YUICHI
分类号 G03F7/20;G01B11/00;H01L21/68 主分类号 G03F7/20
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