Charged Particle Beam Device and Overlay Misalignment Measurement Method

摘要

An overlay misalignment amount of patterns on different layers can be accurately measured. To achieve this, a charged particle beam device includes: a charged particle beam source irradiating a sample with a charged particle beam under one irradiation condition; a first detector that detects a signal generated front a first pattern formed on a first layer in an irradiation region; a second detector that detects a signal generated from a second pattern formed on a second layer in the irradiation region at a same time as the first detector; and an image processing unit that calculates an overlay misalignment amount between the first pattern and the second pattern based on a first detection signal and a second detection signal output by the first detector and the second detector, respectively.

主权项

1. A charged particle beam device comprising:
a charged particle beam source that irradiates a sample with a charged particle beam under one irradiation condition; a first detector that detects a signal generated from a first pattern formed on a first layer in a measurement region; a second detector that detects a signal generated from a second pattern formed on a second layer in the measurement region at a same time as the first detector; and an image processing unit that measures an overlay misalignment amount between the first pattern and the second pattern based on a first detection signal and a second detection signal output by the first detector and the second detector, respectively.