METHOD FOR STRETCHING DEPOSITION MASK, METHOD FOR PRODUCING FRAME-ATTACHED DEPOSITION MASK, METHOD FOR PRODUCING ORGANIC SEMICONDUCTOR ELEMENT, AND STRETCHING DEVICE

摘要

The present invention addresses the problem of providing: a method for stretching a deposition mask, whereby it becomes possible to stretch a deposition mask in a simple manner; a method for producing a frame-attached deposition mask employing the stretching method; a method for producing an organic semiconductor element, whereby it becomes possible to produce an organic semiconductor device with high accuracy; and a stretching device which can be used for the methods. The problem can be solved by a method for stretching a deposition mask (100) which is produced by laminating a metal mask (10) having slits (15) formed therein on a resin mask (20) having openings (25) formed therein, wherein the openings (25) correspond to patterns to be produced by the deposition and are formed at positions that overlap the slits. In the method, stretching-assistant members (50) are superposed on one surface of the deposition mask (100), the stretching-assistant members (50) are fixed onto the deposition mask at at least parts of areas in which the one surface of the deposition mask (100) overlaps the stretching-assistant members (50), and the stretching-assistant members (50) fixed onto the deposition mask (100) are then pulled. In this manner, the deposition mask fixed onto the stretching-assistant members (50) can be stretched.