| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern forming method that reduces influence of development time on pattern forming properties and allows a developer to exhibit, even after storage for a prescribed period, pattern forming properties comparable to those before the storage.SOLUTION: A pattern forming method has, in the stated order: a step (1) of forming a film on a substrate using an active light-sensitive or radiation-sensitive resin composition containing at least a resin having a group that is decomposed by the action of an acid so as to generate a polar group; a step (2) of exposing the film; a step (3) of bringing the exposed film into contact with components having any of an ion-bond, hydrogen-bond, chemical-bond, or dipolar interactions with the polar group generated within the exposed film, substantially without dissolving the exposed film; and a step (4) of developing the exposed film using a developing fluid containing an organic solvent, removing low-exposure regions in the film, and forming a pattern. |
