MASK FOR FORMING ORGANIC FILM PATTERN, AND ORGANIC FILM PATTERN FORMING METHOD AND ORGANIC LIGHT EMITTING DISPLAY MANUFACTURING METHOD USING THE MASK

摘要

PROBLEM TO BE SOLVED: To provide: a mask for forming an organic film pattern capable of increasing a use amount of an organic film material and increasing application efficiency of the mask for forming an organic film pattern; and an organic film pattern forming method and an organic light emitting display manufacturing method that use the mask.SOLUTION: A mask for forming an organic film pattern includes: a photomask having a first substrate and a reflecting film formed on the first substrate; and a donor substrate separated from and located above the photomask, the donor substrate including a second substrate and an absorption film formed on the second substrate. The photomask may comprise a reflecting part configured to reflect light incident on the photomask, and a light concentrating part configured to concentrate the light and transmit the light to the donor substrate.