发明名称 化合物半導体装置及びその製造方法
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a compound semiconductor device capable of sufficiently suppressing current collapse, and to provide a method of manufacturing the same. <P>SOLUTION: A compound semiconductor device includes: a substrate 1; a compound semiconductor stacked structure 2 formed on the substrate 1; a gate electrode 3 formed on the compound semiconductor stacked structure 2; and two ohmic electrodes 4a and 4b sandwiching the gate electrode 3 therebetween in a plan view. The compound semiconductor device further includes a field plate 6 that is provided above the gate electrode 3 and is insulatedly separated from the gate electrode 3 and the ohmic electrodes 4a and 4b. At least one end of the field plate 6 in a direction connecting the ohmic electrodes 4a and 4b to each other is located between the ohmic electrodes 4a and 4b and the gate electrode 3 in a plan view. <P>COPYRIGHT: (C)2013,JPO&INPIT</p>
申请公布号 JP5790227(B2) 申请公布日期 2015.10.07
申请号 JP20110157828 申请日期 2011.07.19
申请人 发明人
分类号 H01L21/338;H01L21/205;H01L21/28;H01L29/06;H01L29/41;H01L29/778;H01L29/812 主分类号 H01L21/338
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