发明名称 ELECTROLESS METAL DEPOSITION FOR MICRON SCALE STRUCTURES
摘要 <p>A method for electroless metal deposition on a surface in a finely dimensioned space (e.g. the bore of a hollow fibre) includes introducing into the space an electroless plating solution that has a nil or relatively low plating rate at normal room temperature, and thereafter heating the structure to an elevated temperature for a period sufficient to cause metal to plate on the wall surface. The introducing and heating may be repeated as necessary or desired to build up a specified thickness.</p>
申请公布号 EP2401418(B1) 申请公布日期 2015.10.07
申请号 EP20100706342 申请日期 2010.02.25
申请人 BAE SYSTEMS PLC 发明人 DUNLEAVY, MICHAEL;HAQ, SAJAD;HUCKER, MARTYN JOHN
分类号 C23C18/16;B29C70/06;C23C18/44 主分类号 C23C18/16
代理机构 代理人
主权项
地址