发明名称 |
SMOOTH DIAMOND SURFACES AND CMP METHOD FOR FORMING |
摘要 |
A method of chemical mechanical polishing (CMP) a diamond containing surface includes providing a slurry including a plurality of particles, at least one oxidizer, and at least one acid, wherein the slurry has a pH≦̸3 or pH greater than 11. At least an outer surface of the plurality of particles is softer than the diamond surface or the particles are diamond particles averaging less than (<) 2 μm in size. The diamond surface is pressed with respect to a polishing pad providing a Shore D Hardness less than 99 having the slurry in between while rotating the polishing pad relative to the diamond surface to form a smooth diamond surface having a root mean square (rms) surface roughness less than 15 nm. |
申请公布号 |
EP2925489(A1) |
申请公布日期 |
2015.10.07 |
申请号 |
EP20130853675 |
申请日期 |
2013.11.06 |
申请人 |
SINMAT, INC.;UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC. |
发明人 |
SINGH, RAJIV, K.;SINGH, DEEPIKA;ARJUNAN, ARUL CHAKKARAVARTHI |
分类号 |
B24B29/02;C09G1/02;C09K3/14;C30B29/04;C30B33/00;H01L21/306;H01L21/311;H01L21/321 |
主分类号 |
B24B29/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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