| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition that excels in lithographic characteristics, improves resolution and can reduce defects, and to provide a method for forming a resist pattern using the resist composition.SOLUTION: A resist composition includes: a base component (A) whose solubility in a developing solution changes by an action of an acid; a nitrogen-containing organic compound component (C); and an acid generator component (B) that generates an acid by exposure. The nitrogen-containing organic compound component (C) includes a photo-base generator (C1) that is a salt between a carboxylic acid represented by general formula (c1-1) and a basic compound. |
