METHOD FOR FROMING REFLECTOR OF PLANAR LIGHTWAVE CIRCUIT DEVICE

摘要

The present invention relates to a method for forming a reflector on a planar lightwave circuit device having a lower clad layer, a core layer and an upper clad layer formed sequentially on top of a substrate, comprising the steps of: sequentially stacking a first metallic layer and a photoresist layer on the upper clad layer and aligning a mask having a master pattern formed thereon on top of the photoresist layer, wherein light-transmitting regions and non-light-transmitting regions are formed repeatedly in a first direction from a reference position, the first widths of the light-transmitting regions between the non-light-transmitting regions gradually become smaller from the reference position in the first direction, and light-transmitting regions and non-light-transmitting regions are formed repeatedly also in a second direction perpendicular to the first direction; forming a slave pattern corresponding the master pattern through the master pattern from the photoresist layer to the first metallic layer; forming an inclined reflector by spraying etching gas to the upper clad layer on a part exposed through the slave pattern to etch from the upper clad layer to the lower clad layer; and coating the reflector. According to the method for forming a reflector of a planar lightwave circuit device, an inclined surface can be formed easily and process time and production costs can be reduced by forming a reflector via etching using the property that the depth of an etched part becomes deeper in proportion to the width of the etched part.