发明名称 |
SEMICONDUCTOR DEFECT ANALYZING DEVICE, DEFECT ANALYZING METHOD, AND DEFECT ANALYZING PROGRAM |
摘要 |
<p>A failure analysis apparatus 10 is composed of an inspection information acquirer 11 for acquiring a failure observed image P2 of a semiconductor device, a layout information acquirer 12 for acquiring layout information, a failure analyzer 13 for analyzing a failure of the semiconductor device, and an analysis screen display controller 14 for letting a display device 40 display information about a result of the analysis. The failure analyzer 13 sets an analysis region with reference to the failure observed image P2, and extracts a net passing the analysis region, from a plurality of nets included in a layout of the semiconductor device. This substantializes a semiconductor failure analysis apparatus, analysis method, and analysis program capable of securely and efficiently performing the analysis of the failure of the semiconductor device.</p> |
申请公布号 |
EP1901079(A4) |
申请公布日期 |
2015.10.07 |
申请号 |
EP20060766970 |
申请日期 |
2006.06.20 |
申请人 |
HAMAMATSU PHOTONICS K.K. |
发明人 |
MAJIMA, TOSHIYUKI;SHIMASE, AKIRA;TERADA, HIROTOSHI;HOTTA, KAZUHIRO;TAKEDA, MASAHIRO |
分类号 |
G01R31/302;G01N21/956;G06T7/00;H01L21/66 |
主分类号 |
G01R31/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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