| 发明名称 |
X-ray generating method, and X-ray generating apparatus |
| 摘要 |
A method for generating an X-ray includes the steps of: disposing at least a target in a chamber; irradiating an electron beam onto the target from an electron beam source disposed in or outside the chamber so as to satisfy a relation of β≦60 degrees if an incident angle of the electron beam is defined as “β”; and generating and taking an X-ray out of the target so as to satisfy a relation of −30 degrees≦β−α≦60 degrees if an output angle of the X-ray relative to a surface of the target is defined as “α”. |
| 申请公布号 |
US9153410(B2) |
申请公布日期 |
2015.10.06 |
| 申请号 |
US201113250475 |
申请日期 |
2011.09.30 |
| 申请人 |
|
发明人 |
Sakabe Noriyoshi;Sakabe Kiwako |
| 分类号 |
H01J35/00;H01J35/26;H01J35/14 |
主分类号 |
H01J35/00 |
| 代理机构 |
Oliff PLC |
代理人 |
Oliff PLC |
| 主权项 |
1. A method for generating an X-ray, comprising the steps of:
disposing at least a target in a chamber; irradiating an electron beam onto said target from an electron beam source disposed in or outside said chamber so as to satisfy a relation of β≦60 degrees if an incident angle of said electron beam is defined as “β”; and generating and taking an X-ray out of said target so as to satisfy a relation of −30 degrees ≦β−α≦60 degrees if an output angle of said X-ray relative to a surface of said target is defined as “α”, wherein said incident ample β is controlled by deflecting an orbit of said electron beam using a deflecting magnet disposed in said chamber. |
| 地址 |
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