发明名称 Stimulated phonon emission device and oscillator, frequency filter, cooling device, light-receiving device, and light-emitting device comprising the stimulated phonon emission device
摘要 A stimulated phonon emission device of an embodiment is provided with a first electroconductive type of semiconductor substrate of an indirect transition type semiconductor crystal, a second electroconductive type of well region provided in the semiconductor substrate, an element isolation region deeper than the well region, an element region surrounded by the element isolation region, and a field-effect transistor having a plurality of gate electrodes which are formed in the well region in the element region, are parallel to each other, and are arranged at a constant pitch and first electroconductive type of source region and drain region provided in the element regions on the both sides of the gate electrode.
申请公布号 US9153680(B2) 申请公布日期 2015.10.06
申请号 US201313965654 申请日期 2013.08.13
申请人 Kabushiki Kaisha Toshiba 发明人 Abe Kazuhide;Itaya Kazuhiko
分类号 H01L29/84;H01L29/772;H01L31/00;H01S4/00 主分类号 H01L29/84
代理机构 Oblon, McClelland, Maier & Neustadt, L.L.P. 代理人 Oblon, McClelland, Maier & Neustadt, L.L.P.
主权项 1. A stimulated phonon emission device comprising: a semiconductor substrate of first electroconductive type, the semiconductor substrate being an indirect transition type semiconductor crystal; a well region of second electroconductive type provided in the semiconductor substrate; an acoustic element isolation region deeper than the well region; an acoustic element region surrounded by the element isolation region; and a field-effect transistor having a plurality of electrically common gate electrodes, source region and drain region, the gate electrodes being provided on the well region in the acoustic element region, the gate electrodes being parallel to each other, the gate electrodes being arranged at a constant pitch, the source region and the drain region having first electroconductive type, the source region and drain region being provided in the well region in the acoustic element regions region on the both sides of the gate electrode; wherein the acoustic element isolation region comprises a cavity.
地址 Minato-ku JP