发明名称 |
Method for producing substrate with metal body |
摘要 |
Provided is a method for producing a substrate with a metal body. This method provides excellent film-forming properties (reflectance and adhesion), is easy to be used on a large substrate, and can be carried out at a low cost. The method includes the steps of: (A) heating a complex to a first temperature so as to generate a vapor of the complex; and (B) contacting the vapor with a substrate heated to a second temperature that is not higher than the first temperature so as to form a metal body containing a central metal of the complex, either in uncombined form or as a compound thereof (exclusive of the complex), on at least part of a surface of the substrate. The second temperature in step (B) is lower than the decomposition temperature of the complex. The central metal of the complex is aluminum or titanium. |
申请公布号 |
US9150962(B2) |
申请公布日期 |
2015.10.06 |
申请号 |
US201414159444 |
申请日期 |
2014.01.21 |
申请人 |
JSR CORPORATION |
发明人 |
Sakai Tatsuya;Nishimura Hideki;Yamamoto Masahiro;Nakagawa Hisashi;Saitou Ryuuichi;Aoki Hideyuki;Furukawa Tsuyoshi |
分类号 |
C23C16/06;H01L21/285;H01L21/3205;H01L21/768;C23C16/18 |
主分类号 |
C23C16/06 |
代理机构 |
Oblon, McClelland, Maier & Neustadt, L.L.P. |
代理人 |
Oblon, McClelland, Maier & Neustadt, L.L.P. |
主权项 |
1. A method for producing a metal body, the method comprising the steps of:
(A) heating a complex comprising a central metal atom to a first temperature so as to generator a vapor of the complex; (B) contacting the vapor with a substrate heated to a second temperature that is not higher than the first temperature so as to form a metal body on at least part of a surface of the substrate, the metal body comprising the central metal atom or a compound of the central metal atom, the compound being other than the complex; and (C) repeating step (A) and step (B) two or more times such that two or more different kinds of metal bodies are formed on the substrate; wherein after a first metal body which comprises titanium atoms is formed on the at least part of the surface of the substrate, a second metal body which comprises aluminum atoms is formed on the first metal body. |
地址 |
Tokyo JP |