发明名称 MEMS microphone device and method for making same
摘要 The present invention discloses a MEMS microphone device and its manufacturing method. The MEMS microphone device includes: a substrate including a first cavity; a MEMS device region above the substrate, wherein the MEMS device region includes a metal layer, a via layer, an insulating material region and a second cavity; a mask layer above the MEMS device region; a first lid having at least one opening communicating with the second cavity, the first lid being fixed above the mask layer; and a second lid fixed under the substrate.
申请公布号 US9150403(B2) 申请公布日期 2015.10.06
申请号 US201313959279 申请日期 2013.08.05
申请人 PIXART IMAGING INCORPORATION, R.O.C. 发明人 Wang Chuan-Wei;Sun Chih-Ming
分类号 H04R1/04;B81B7/00;H04R19/04;H04R19/00 主分类号 H04R1/04
代理机构 Tung & Associates 代理人 Tung & Associates
主权项 1. A MEMS microphone device, comprising: a substrate including a first cavity; a MEMS device region above the substrate, wherein the MEMS device region includes at least one metal layer, at least one metal via layer, an insulating material region and a second cavity, wherein a portion of the at least one metal layer and a portion of the at least one metal via layer form a membrane and the second cavity is formed below the membrane; a mask layer above the MEMS device region; a first lid having at least one opening communicating with the second cavity and the first cavity, the first lid being fixed above the mask layer; and a second lid fixed under the substrate.
地址 Hsin-Chu TW