发明名称 |
MEMS microphone device and method for making same |
摘要 |
The present invention discloses a MEMS microphone device and its manufacturing method. The MEMS microphone device includes: a substrate including a first cavity; a MEMS device region above the substrate, wherein the MEMS device region includes a metal layer, a via layer, an insulating material region and a second cavity; a mask layer above the MEMS device region; a first lid having at least one opening communicating with the second cavity, the first lid being fixed above the mask layer; and a second lid fixed under the substrate. |
申请公布号 |
US9150403(B2) |
申请公布日期 |
2015.10.06 |
申请号 |
US201313959279 |
申请日期 |
2013.08.05 |
申请人 |
PIXART IMAGING INCORPORATION, R.O.C. |
发明人 |
Wang Chuan-Wei;Sun Chih-Ming |
分类号 |
H04R1/04;B81B7/00;H04R19/04;H04R19/00 |
主分类号 |
H04R1/04 |
代理机构 |
Tung & Associates |
代理人 |
Tung & Associates |
主权项 |
1. A MEMS microphone device, comprising:
a substrate including a first cavity; a MEMS device region above the substrate, wherein the MEMS device region includes at least one metal layer, at least one metal via layer, an insulating material region and a second cavity, wherein a portion of the at least one metal layer and a portion of the at least one metal via layer form a membrane and the second cavity is formed below the membrane; a mask layer above the MEMS device region; a first lid having at least one opening communicating with the second cavity and the first cavity, the first lid being fixed above the mask layer; and a second lid fixed under the substrate. |
地址 |
Hsin-Chu TW |