发明名称 Laser-marking additive
摘要 This invention relates to a laser-marking additive wherein the laser-marking additive comprises a bismuth containing compound and a functionalized polymer having 0.01 to 50 wt % of functional groups, in which the weight percentage is based on the total amount of functionalized polymer and bismuth containing compound. The invention further relates to a method for preparation of such laser-marking additive, a laser-markable composition comprising such laser-marking additives and preparation thereof and molded parts comprising the laser-markable composition, as well as films made from the laser-markable composition.
申请公布号 US9150702(B2) 申请公布日期 2015.10.06
申请号 US201013502431 申请日期 2010.10.25
申请人 DSM IP ASSETS B.V. 发明人 Gelissen Franciscus Wilhelmus Maria;Van Duijnhoven Franciscus Gerardus Henricus
分类号 F21V9/00;G02B5/02;G02C7/10;G02F1/361;G03B11/00;C08K3/22;B41M5/26;B29C65/00;B32B37/00;B32B38/04;B41M5/00;B44C1/17 主分类号 F21V9/00
代理机构 Nixon & Vanderhye P.C. 代理人 Nixon & Vanderhye P.C.
主权项 1. A laser-marking additive comprising: a functionalized carrier polymer, and a bismuth-containing compound melt-blended with the functionalized carrier polymer, wherein the bismuth-containing compound is at least one selected from the group consisting of Bi2O3 and Bi-citrate, and wherein the functionalized carrier polymer comprises an amount of functional groups based on total weight of the functionalized polymer and the bismuth-containing compound of 0.01 to 50 wt % sufficient to achieve no discoloration of a thermoplastic matrix polymer when the laser-marking additive is melt-blended with the thermoplastic matrix polymer at a temperature above 220° C., wherein the laser-marking additive is antimony-free and halogen-free.
地址 Heerlen NL