Antireflective coating composition and process thereof

摘要

The present invention relates to an absorbing hard mask antireflective coating composition comprising a novel polymer, where the novel polymer comprises in the backbone of the polymer four repeat units -A-, -B-, -C- and -D-, where A is repeat unit which comprises a fused aromatic ring in its backbone, B has the structure (1), C is a hydroxylbiphenyl of structure (2) and D is a derivatized fluorene of structure (3),;
where R1 is C1-C4alkyl, R2 is C1-C4alkyl, R3 and R4 are independently hydrogen or C1-C4 alkyl, and Ar′ and Ar″ are independently phenylenic, or naphthalenic derived moieties, R5 and R6 are independently —OH or —(CH2)nOH where n=2-4, and R7 and R8 are independently hydrogen or C1-C4 alkyl. This invention also relates to a process for forming an image using the novel antireflective coating composition.

主权项

1. An antireflective coating composition comprising a polymer capable of being crosslinked, where the polymer comprises at least one repeat unit (A) comprising a fused aromatic unit in the polymer backbone, at least one repeat unit (B) having a structure (1), at least one repeat unit (C) comprising hydroxybiphenyl repeat unit of structure (2), and at least one repeat unit (D) comprising a fluorene repeat unit of structure (3),where R1 is C1-C4alkyl, R2 is C1-C4 alkyl, R3 and R4 are independently hydrogen or a C1-C4 alkyl, Ar′ and Ar″ are independently phenylenic or naphthalenic group, R5 and R6 are independently —OH or —(CH2)n—OH where n=2-4, and R7 and R8 are independently hydrogen or C1-C4 alkyl; and, a solvent.