发明名称 |
Fusing method of substrate layer, manufacturing method of microfluidic chip and fusing apparatus of substrate layer |
摘要 |
Provided is a fusing method of a substrate layer including: treating a joining surface of a substrate layer formed from a resin using an organic solvent having solubility with respect to the resin; and heating the treated substrate layer at less than a glass transition temperature or a softening point temperature of the resin and crimping the heated substrate layer. |
申请公布号 |
US9150411(B2) |
申请公布日期 |
2015.10.06 |
申请号 |
US201213663211 |
申请日期 |
2012.10.29 |
申请人 |
SONY CORPORATION;SONY DADC CORPORATION |
发明人 |
Okawa Naoki;Suzuki Yukie |
分类号 |
B29C65/00;B81C3/00;B29C65/48 |
主分类号 |
B29C65/00 |
代理机构 |
K&L Gates LLP |
代理人 |
K&L Gates LLP |
主权项 |
1. A method of fusing a first substrate layer and a second substrate layer comprising:
treating a joining surface of one of the first substrate layer and the second substrate layer formed from a resin using an organic solvent having solubility with respect to the resin; heating the first substrate layer and the second substrate layer after the organic solvent treatment at a heating temperature less than a glass transition temperature or a softening point temperature of the resin and crimping the heated substrate layers together; removing the organic solvent remaining on the crimped substrate layers; and pressurizing the crimped substrate layers after removing the organic solvent while heating at a temperature which is higher than the heating temperature and lower than the glass transition temperature or the softening point temperature of the resin. |
地址 |
Tokyo JP |