| 发明名称 | X-ray mask structure and method for preparing the same | ||
| 摘要 | An X-ray mask structure includes a unibody support substrate having at least one thinned portion surrounded by a wall portion, a top layer disposed on the at least one thinned portion of the support substrate, and a plurality of X-ray absorber patterns disposed on the top layer over the at least one thinned portion. The top layer and the at least one thinned portion form a laminated membrane, wherein the at least one thinned portion and the wall portion provide mechanical support for the top layer, and the laminated membrane provides mechanical support for the plurality of X-ray absorber patterns. | ||
| 申请公布号 | US9152036(B2) | 申请公布日期 | 2015.10.06 |
| 申请号 | US201314081529 | 申请日期 | 2013.11.15 |
| 申请人 | NATIONAL SYNCHROTRON RADIATION RESEARCH CENTER | 发明人 | Shew Bor Yuan |
| 分类号 | G03F7/20;H01L21/308;G03F1/22 | 主分类号 | G03F7/20 |
| 代理机构 | Hamre, Schumann, Mueller & Larson, P.C. | 代理人 | Hamre, Schumann, Mueller & Larson, P.C. |
| 主权项 | 1. A method for preparing an X-ray mask structure, comprising: providing a support substrate having a top surface and a bottom surface; forming a top layer on the top surface and a bottom layer having an aperture on the bottom surface; removing a portion of the support substrate exposed by the aperture of the bottom layer to form at least one thinned portion of the support substrate, the thinned portion being surrounded by a wall portion being made of the same dopant-free material as the thinned portion; and forming a plurality of X-ray absorber patterns on the top layer over the at least one thinned portion. | ||
| 地址 | Hsinchu TW | ||