发明名称 |
Passive capacitively-coupled electrostatic (CCE) probe method for detecting plasma instabilities in a plasma processing chamber |
摘要 |
A method for detecting plasma instability within a processing chamber of a plasma processing system during substrate processing is provided. The method includes collecting a set of process data, the process data including a set of induced current signals flowing through a measuring capacitor. The method further includes converting the set of induced current signals into a set of analog voltage signals and converting the set of analog voltage signals into a set of digital signals. The method also includes analyzing the set of digital signals to detect high frequency perturbations, the high frequency perturbations indicating the plasma instability. |
申请公布号 |
US9153421(B2) |
申请公布日期 |
2015.10.06 |
申请号 |
US201213470187 |
申请日期 |
2012.05.11 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
Booth Jean-Paul;Nagai Mikio;Keil Douglas |
分类号 |
G01R31/00;H01J37/32 |
主分类号 |
G01R31/00 |
代理机构 |
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代理人 |
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主权项 |
1. A method for detecting plasma instability within a processing chamber of a plasma processing system during substrate processing, comprising:
collecting a set of process data including a set of induced current signals, wherein the set of induced current signals corresponds to current induced to flow through a measuring capacitor by plasma within the processing chamber, and wherein a first plate of the measuring capacitor is connected to a plasma-facing sensor and the induced current signals are measured at a second plate of the measuring capacitor; converting said set of induced current signals into a set of analog voltage signals; converting said set of analog voltage signals into a set of digital signals; and analyzing said set of digital signals to detect high frequency perturbations, said high frequency perturbations indicating said plasma instability. |
地址 |
Fremont CA US |