Lithographic apparatus and device manufacturing method involving a member and a fluid opening

摘要

An exposure apparatus including a movable table, a member, movably separate from the table and located on a top surface of the table, to provide a surface substantially co-planar with a top surface of an object in or on the table, a projection system configured to project a radiation beam onto a radiation-sensitive target portion of a substrate, and a liquid supply system configured to provide a liquid to a space between the projection system and the object.

主权项

1. An exposure apparatus comprising:
a movable table comprising a top surface having an object support surface portion to support an object; a member, movably separate from the table and located on a member support surface portion of the top surface of the table, to provide a surface substantially co-planar with a top surface of the object in or on the table, wherein the object and member support surface portions are substantially co-planar; a projection system configured to project a radiation beam onto a radiation-sensitive target portion of a substrate; and a liquid supply system configured to provide a liquid to a space between the projection system and the object, the liquid supply system comprising an inlet to supply the liquid, wherein the table further comprises a recess recessed into the top surface of the table and extending below the object and member support surface portions and a fluid opening, below a gap opening between the object when supported on the table and the member, to remove the liquid entering the gap opening, the fluid opening being separate from the inlet and in an upwardly facing surface of the recess below the object and member support surface portions, the upwardly facing surface extending on opposite sides of the fluid opening.