发明名称 Plasma generating device, plasma generating method, and method for suppressing ozone generation
摘要 The purpose of the present invention is to minimize ozone production while increasing the production of an active species. The plasma generating device (100) comprises: a pair of electrodes (21, 22) in which dielectric films (21a, 21b) are disposed on at least one opposing face; voltage application means (4) for applying a pulse voltage across the electrodes (21, 22) to bring about a plasma discharger; and fluid circulation holes (21b, 22b) that are disposed in locations corresponding to the electrodes (21, 22), respectively, and that are configured to pass entirely therethrough. The plasma generating device is also configured such that a fluid passing through the fluid circulation holes (21b, 22b) comes into contact with the plasma, generating ions or radicals, wherein the voltage applying means (4) varies the peak value and/or the pulse width of the pulse voltage applied across the electrodes (21, 22).
申请公布号 US9149551(B2) 申请公布日期 2015.10.06
申请号 US201113884469 申请日期 2011.11.09
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 Takenoshita Kazutoshi;Miyamoto Makoto;Yuge Seiro;Kumagai Yuki;Nakayama Yoko;Nojima Hideo;Kim Myung Chul
分类号 A61L2/00;A62B7/08;B01J19/08;H05F3/00;A61L9/015;A61L9/22;H05H1/24 主分类号 A61L2/00
代理机构 Staas & Halsey LLP 代理人 Staas & Halsey LLP
主权项 1. A plasma generator including a pair of electrodes provided with a dielectric film on at least one facing surface thereof, a voltage applying unit which applies a pulse voltage between the electrodes to discharge plasma, and fluid circulation holes which are respectively provided at positions corresponding to the respective electrodes such that the respective electrodes are configured to be penetrated as a whole, the plasma generator being configured such that ions or radicals are generated by coming into contact with the plasma when fluid passes through the fluid circulation holes, wherein the voltage applying unit varies a peak value or a pulse width of the pulse voltage applied between the electrodes, or both thereof, wherein the voltage applying unit is configured to adjust the pulse width of the pulse voltage applied between the electrodes within a range of 1 μs to 100 μs.
地址 Suwon-Si KR