| 发明名称 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition | ||
| 摘要 | According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes (A) a resin that when acted on by an acid, increases its solubility in an alkali developer, (B) a compound that when exposed to actinic rays or radiation, generates an acid, and (C) a resin containing at least one group selected from among the following groups (x) to (z) and further containing at least either a fluorine atom or a silicon atom, in which three or more polymer chains are contained through at least one branch point, (x) an alkali-soluble group, (y) a group that when acted on by an alkali developer, is decomposed to thereby increase its solubility in the alkali developer, and (z) a group that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer. | ||
| 申请公布号 | US9152048(B2) | 申请公布日期 | 2015.10.06 |
| 申请号 | US201012905742 | 申请日期 | 2010.10.15 |
| 申请人 | FUJIFILM Corporation | 发明人 | Saegusa Hiroshi;Iwato Kaoru;Iizuka Yusuke;Koshijima Kousuke |
| 分类号 | G03F7/004;G03F7/38;G03F7/039;G03F7/075;G03F7/20 | 主分类号 | G03F7/004 |
| 代理机构 | Sughrue Mion, PLLC | 代理人 | Sughrue Mion, PLLC |
| 主权项 | 1. An actinic-ray- or radiation-sensitive resin composition comprising: (A) a resin that when acted on by an acid, increases its solubility in an alkali developer, wherein the content ratio of the resin (A) is in the range of 60 to 95 mass % based on the total solids of the composition, and wherein the resin (A) is a linear polymer, (B) a compound that when exposed to actinic rays or radiation, generates an acid, and (C) a resin containing at least one group selected from among the following groups (x) to (z) and further containing at least a fluorine atom, in which three or more polymer chains which comprise a plurality of repeating units are contained through at least one branch point, (x) an alkali-soluble group, (y) a group that when acted on by an alkali developer, is decomposed to thereby increase its solubility in the alkali developer, and (z) a group that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer, wherein the content ratio of the resin (C) is in the range of 0.01 to 20 mass % based on the total solids of the composition, and wherein the resin (C) is a star polymer. | ||
| 地址 | Tokyo JP | ||