Actinic-ray- or radiation-sensitive resin composition, actinic-ray-or radiation-sensitive film therefrom, method of forming pattern, process for manufacturing semiconductor device, semiconductor device and compound

摘要

Provided is an actinic-ray- or radiation-sensitive resin composition including a compound that when exposed to actinic rays or radiation, generates any of acids of general formula (I) below.;

主权项

1. An actinic-ray- or radiation-sensitive resin composition comprising a compound that when exposed to actinic rays or radiation, generates any of acids of general formula (I) below, in which L1 represents a single bond, —O—, —S—, —C(═O)—, —C(═O)O—, —OC(═O)—, —S(═O)—, —S(═O)2—, an optionally substituted methylene group or an optionally substituted ethylene group; Ar1 represents an aryl group; R1 represents a monovalent substituent, provided that at least one R1 represents a group having two or more carbon atoms, and that when n is 2 or greater, two or more R1s may be identical to or different from each other and may be connected to each other to thereby form a ring; m is an integer of 1 to 4; and n is an integer of 2 to 5.