| 摘要 |
<p>PROBLEM TO BE SOLVED: To solve such a problem, in a substrate processing apparatus where chemical is supplied to the upper surface of a substrate while rotating, that chemical mist adheres to the inside of a cup arranged around the substrate and receiving process liquid, and it is difficult to clean the chemical mist adhering to the inside of the cup.SOLUTION: A cup includes an inclined plane continuous from the upper end of the outer side face, and an inner side face continuous smoothly from the inclined plane. When cleaning a spin chuck by supplying cleaning liquid thereto and scattering the cleaning liquid, positional relationship of the cup and spin chuck is adjusted so that the cleaning liquid flows along the inner side face from below the inclined plane.</p> |
