发明名称 |
APPARATUS AND METHOD FOR FORMING FILM, AND CYLINDRICAL MEMBER HAVING FILM |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming a uniform film on a member to be processed using plasma when a plasma ion implantation method is performed in order to form a film on a three-dimensional shaped member.SOLUTION: A method for forming a film comprises: forming plasma using a plasma generation element 14 in a region around a part of a member 11 to be processed in an extending direction in a processing space; applying pulse voltage to the member 11 to be processed; implanting ions formed from a gas in the processing space by the plasma into a thin film formed on the member to be processed 11 by the plasma to form a film on the member 11 to be processed; changing a position at which plasma is formed, by moving the plasma generation element 14 in the extending direction during or after plasma generation and ion implantation; and repeating the plasma generation, the ion implantation and the movement of the plasma generation element in the extending direction. |
申请公布号 |
JP2015175019(A) |
申请公布日期 |
2015.10.05 |
申请号 |
JP20140051578 |
申请日期 |
2014.03.14 |
申请人 |
MITSUI ENG & SHIPBUILD CO LTD |
发明人 |
TAKIZAWA KAZUKI |
分类号 |
C23C14/48;C23C16/515;H05H1/46 |
主分类号 |
C23C14/48 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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