发明名称 APPARATUS AND METHOD FOR FORMING FILM, AND CYLINDRICAL MEMBER HAVING FILM
摘要 PROBLEM TO BE SOLVED: To provide a method for forming a uniform film on a member to be processed using plasma when a plasma ion implantation method is performed in order to form a film on a three-dimensional shaped member.SOLUTION: A method for forming a film comprises: forming plasma using a plasma generation element 14 in a region around a part of a member 11 to be processed in an extending direction in a processing space; applying pulse voltage to the member 11 to be processed; implanting ions formed from a gas in the processing space by the plasma into a thin film formed on the member to be processed 11 by the plasma to form a film on the member 11 to be processed; changing a position at which plasma is formed, by moving the plasma generation element 14 in the extending direction during or after plasma generation and ion implantation; and repeating the plasma generation, the ion implantation and the movement of the plasma generation element in the extending direction.
申请公布号 JP2015175019(A) 申请公布日期 2015.10.05
申请号 JP20140051578 申请日期 2014.03.14
申请人 MITSUI ENG & SHIPBUILD CO LTD 发明人 TAKIZAWA KAZUKI
分类号 C23C14/48;C23C16/515;H05H1/46 主分类号 C23C14/48
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