发明名称 OXIDE SEMICONDUCTOR MATERIAL AND SEMICONDUCTOR ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide an In-Ga-Zn-O-based oxide semiconductor material and a semiconductor element, which has the combination of n-type characteristic and p-type characteristic.SOLUTION: An oxide semiconductor material includes In, Ga, Zn and O as constituents and has p-type characteristic and n-type characteristic depending on a direction of electric field. In, Ga, Zn and O are molecularly bonded with each other on a substrate and can be used as a semiconductor element. For example, by forming a source and a drain which have a channel layer composed of the oxide semiconductor material, a function as a CMOS can be achieved by switching positive and negative of voltage applied to a gate.
申请公布号 JP2015176964(A) 申请公布日期 2015.10.05
申请号 JP20140051383 申请日期 2014.03.14
申请人 JAPAN STEEL WORKS LTD:THE 发明人 TAKEDA ETSUJI;MATSUMOTO TATSUYA;KANAZAWA MASAHITO;MORITA SUSUMU
分类号 H01L29/786;H01L21/20;H01L21/36;H01L21/363;H01L21/368;H01L29/26;H01L29/66 主分类号 H01L29/786
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