发明名称 SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device having high withstand voltage.SOLUTION: A semiconductor device including a first region and a second region comprises: a first electrode 1; a first conductivity type first semiconductor layer 2; a second conductivity type second semiconductor layer 4; a first conductivity type third semiconductor layer provided on the second semiconductor layer in the second region; a plurality of second electrodes 6 which are opposite to the second semiconductor layer and the first semiconductor layer in the first region, and the third semiconductor layer in the second region and the third semiconductor layer, the second semiconductor layer and the fist semiconductor layer via a first insulation film 11 and which straddle the first region and the second region; a plurality of third electrodes 7 with parts straddling the first region and the second region via a second insulation film 12 and with the other part being provided at a distance from each other in the second region; a third insulation film 14 provided in the first region; a fourth electrode 8; a fourth insulation film provided in the second region; and a fifth electrode.
申请公布号 JP2015176900(A) 申请公布日期 2015.10.05
申请号 JP20140050258 申请日期 2014.03.13
申请人 TOSHIBA CORP 发明人 KAWAGUCHI YUSUKE;NOZU TETSUO;KATO SHUNSUKE
分类号 H01L29/78 主分类号 H01L29/78
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