发明名称 |
TRANSISTOR AND METHOD FOR FABRICATING THE SAME |
摘要 |
Provided is a method for manufacturing a transistor. The method for manufacturing a transistor comprises the following steps of: forming a pin part protruding from a substrate; forming an element separation pattern covering a sidewall of the pin part on the substrate; forming a trench in the element separation pattern and exposing an upper surface and sidewalls of a channel area of the pin part by the trench; and increasing the volume of the channel area of the pin part by injecting a group 4 element into the channel area of the pin part. |
申请公布号 |
KR20150110946(A) |
申请公布日期 |
2015.10.05 |
申请号 |
KR20140033484 |
申请日期 |
2014.03.21 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
HWANG, HEE DON;LEE, DONG KAK;LEE, MIN KYOUNG |
分类号 |
H01L21/336;H01L29/16;H01L29/78 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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