发明名称 TRANSISTOR AND METHOD FOR FABRICATING THE SAME
摘要 Provided is a method for manufacturing a transistor. The method for manufacturing a transistor comprises the following steps of: forming a pin part protruding from a substrate; forming an element separation pattern covering a sidewall of the pin part on the substrate; forming a trench in the element separation pattern and exposing an upper surface and sidewalls of a channel area of the pin part by the trench; and increasing the volume of the channel area of the pin part by injecting a group 4 element into the channel area of the pin part.
申请公布号 KR20150110946(A) 申请公布日期 2015.10.05
申请号 KR20140033484 申请日期 2014.03.21
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 HWANG, HEE DON;LEE, DONG KAK;LEE, MIN KYOUNG
分类号 H01L21/336;H01L29/16;H01L29/78 主分类号 H01L21/336
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