| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing pad which has a high polishing speed and has excellent flattening characteristics, and a method for manufacturing the same.SOLUTION: In a polishing pad having a polishing layer formed of a polyurethane resin foam, a polyurethane resin which is a formation material of the polyurethane resin foam has an alkoxysilyl group represented by general formula (1) in a side chain. In general formula (1), X is ORor OH, and Rare each independently an alkyl group having 1 to 4 carbon atoms. Flattening characteristics are enhanced by an increase in elasticity modulus of the polishing layer, and a polishing speed is enhanced by an increase in a slurry holding capability due to the foam and hydrophilizing. |
