发明名称 |
PRODUCTION METHOD OF VAPOR DEPOSITION MASK DEVICE WITH SUBSTRATE, AND VAPOR DEPOSITION MASK WITH SUBSTRATE |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a production method of a vapor deposition mask device with a substrate capable of imparting tension having a proper value to a vapor deposition mask, and executing plating treatment efficiently, highly accurately, stably and productively.SOLUTION: A production method of a vapor deposition mask device with a substrate includes steps for: forming a multi-surfaced resist pattern 3 for plating treatment corresponding to a plurality of vapor deposition masks; cutting a glass substrate 1 slenderly; and forming a vapor deposition mask 2 by plating treatment by using the resist pattern 3 as a mask.</p> |
申请公布号 |
JP2015175028(A) |
申请公布日期 |
2015.10.05 |
申请号 |
JP20140052534 |
申请日期 |
2014.03.14 |
申请人 |
DAINIPPON PRINTING CO LTD |
发明人 |
SEKI KENTARO;SHIMAZAKI HIROSHI;OKUDA TORU;SAKATA HIROKI;MIYAZAKI SUSUMU |
分类号 |
C23C14/24;H01L51/50;H05B33/10 |
主分类号 |
C23C14/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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