发明名称 PRODUCTION METHOD OF VAPOR DEPOSITION MASK DEVICE WITH SUBSTRATE, AND VAPOR DEPOSITION MASK WITH SUBSTRATE
摘要 <p>PROBLEM TO BE SOLVED: To provide a production method of a vapor deposition mask device with a substrate capable of imparting tension having a proper value to a vapor deposition mask, and executing plating treatment efficiently, highly accurately, stably and productively.SOLUTION: A production method of a vapor deposition mask device with a substrate includes steps for: forming a multi-surfaced resist pattern 3 for plating treatment corresponding to a plurality of vapor deposition masks; cutting a glass substrate 1 slenderly; and forming a vapor deposition mask 2 by plating treatment by using the resist pattern 3 as a mask.</p>
申请公布号 JP2015175028(A) 申请公布日期 2015.10.05
申请号 JP20140052534 申请日期 2014.03.14
申请人 DAINIPPON PRINTING CO LTD 发明人 SEKI KENTARO;SHIMAZAKI HIROSHI;OKUDA TORU;SAKATA HIROKI;MIYAZAKI SUSUMU
分类号 C23C14/24;H01L51/50;H05B33/10 主分类号 C23C14/24
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